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Process design kit for NIST superconducting optoelectronic technologies

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SOEN PDK

NIST Superconducting Optoelectronic Networks (SOEN) Process Design Kits (PDK).

This kit defines the OLMEC process, which combines superconducting electronics, such as SNSPDs and three-terminal devices, active optoelectronics, such as LEDs and modulators, and passive optics, such as waveguides and resonators.

Installation

git clone [email protected]:usnistgov/SOEN-PDK.git
pip install lygadgets
lygadgets_link SOEN-PDK/tech/OLMAC

If you are a Windows/Anaconda user, you must do these commands within an Anaconda 3 prompt with administrator privileges.

Salt package to come.

PyPI release is not planned.

Documentation

All the documentation is html. It is found on the WWW at pages.nist.gov (not yet).

For now, you must build and view it yourself with

make docs
open docs/_build/html/index.html

Dependencies

There are no explicit python dependencies, but there are some needed for full functionality.

To build the pcells

pip install phidl

To have the pcells appear in the KLayout GUI and the klayout.db standalone

pip install lygadgets
lygadgets_link lygadgets

NIST Developers

Branching structure

  • master [protected]: release code, must work at all times; pulls only from development; every merge commit is a tagged version such as "v0.1.1"
  • development: base point for new features, should be working almost all the time; when ready, merges new features into master
  • nist-pages [protected]: documentation "master" that is hosted, based off of development and pulls only from development; features documented that are not yet released should be marked as "beta" or "pre-release"
  • other: in-progress features, based off of development

[protected] means there are no direct commits.

Directory structure

It is designed to be able to hold independent PDKs for multiple processes. These can be installed into klayout one at a time.

How to document

Jekyll setup, viewing your local changes, Markup languages, documentation structure...

Authors: Sonia Buckley, Jeff Shainline, Adam McCaughan, Jeff Chiles, Alex Tait, Rich Mirin, Sae Woo Nam

National Institute of Standards and Technology, Boulder, CO, USA

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